Comparative study of microcrystalline silicon films...

Journal of Non-Crystalline Solids 2000 Vol. 266-269; Iss. part-P1

Comparative study of microcrystalline silicon films prepared in low or high pressure regime by hot-wire chemical vapor deposition

C Niikura, J Guillet, R Brenot, B Equer, J.E Bourée, C Voz, D Peiro, J.M Asensi, J Bertomeu, J Andreu
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Volume:
266-269
Year:
2000
Language:
english
DOI:
10.1016/s0022-3093(99)00738-3
File:
PDF, 150 KB
english, 2000
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