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High rate growth of microcrystalline silicon at low temperatures
Michio Kondo, Makoto Fukawa, Lihui Guo, Akihisa MatsudaVolume:
266-269
Year:
2000
Language:
english
DOI:
10.1016/s0022-3093(99)00744-9
File:
PDF, 211 KB
english, 2000