Light emitting wide band gap a-Si:H deposited by microwave electron cyclotron resonance plasma-enhanced chemical vapour deposition
K Luterová, P Fojtı́k, A Poruba, J Dian, J Valenta, H Stuchlı́ková, J Štěpánek, J Kočka, I PelantVolume:
266-269
Year:
2000
Language:
english
DOI:
10.1016/s0022-3093(99)00745-0
File:
PDF, 161 KB
english, 2000