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Comparison of gas-phase reactions in low-temperature growth of Si films by photochemical vapor deposition and the hot wire cell method
Katsuya Abe, Takeshi Tsushima, Mitsuru Ichikawa, Akira Yamada, Makoto KonagaiVolume:
266-269
Year:
2000
Language:
english
DOI:
10.1016/s0022-3093(99)00749-8
File:
PDF, 151 KB
english, 2000