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Mechanism of low-temperature crystallization of amorphous silicon by atomic hydrogen anneal
Akira Heya, Atsushi Masuda, Hideki MatsumuraVolume:
266-269
Year:
2000
Language:
english
DOI:
10.1016/s0022-3093(99)00754-1
File:
PDF, 156 KB
english, 2000