Ab initio study of atomic Cl adsorption on stoichiometric...

Surface Science 2000 Vol. 454-456; Iss. none

Ab initio study of atomic Cl adsorption on stoichiometric and reduced rutile TiO2 (110) surfaces

Doris Vogtenhuber, Raimund Podloucky, J. Redinger
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Volume:
454-456
Year:
2000
Language:
english
DOI:
10.1016/s0039-6028(00)00146-1
File:
PDF, 285 KB
english, 2000
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