Fundamental processes of microcrystalline silicon film...

Surface Science 2000 Vol. 458; Iss. 1-3

Fundamental processes of microcrystalline silicon film growth: a molecular dynamics study

Tatusya Ohira, Osamu Ukai, Matsuhei Noda
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Volume:
458
Year:
2000
Language:
english
DOI:
10.1016/s0039-6028(00)00447-7
File:
PDF, 893 KB
english, 2000
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