Variation of threshold field in field induced fabrication...

Variation of threshold field in field induced fabrication of Au nanodots on ultrathin in situ grown silicon oxide

J.Y. Park, R.J. Phaneuf, E.D. Williams
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Volume:
470
Year:
2000
Language:
english
DOI:
10.1016/s0039-6028(00)00897-9
File:
PDF, 411 KB
english, 2000
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