Computed energetics for etching of the...

Surface Science 2002 Vol. 496; Iss. 3

Computed energetics for etching of the Si(1 0 0) surface by F and Cl atoms

Stephen P. Walch
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Volume:
496
Year:
2002
Language:
english
DOI:
10.1016/s0039-6028(01)01381-4
File:
PDF, 522 KB
english, 2002
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