Aryltriazene Photopolymers for UV-Laser Applications:...

Aryltriazene Photopolymers for UV-Laser Applications: Improved Synthesis and Photodecomposition Study

Matthias Nagel, Roland Hany, Thomas Lippert, Martin Molberg, Frank A. Nüesch, Daniel Rentsch
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Volume:
208
Year:
2007
Language:
english
Pages:
10
DOI:
10.1002/macp.200600492
File:
PDF, 325 KB
english, 2007
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