Poly(2-vinylnaphthalene)-block-poly(acrylic acid) Block Copolymer: Self-Assembled Pattern Formation, Alignment, and Transfer into Silicon via Plasma Etching
Xin Zhang, Christopher J. Metting, Robert M. Briber, Florian Weilnboeck, Sang Hak Shin, Benjamin G. Jones, Gottlieb S. OehrleinVolume:
212
Year:
2011
Language:
english
Pages:
7
DOI:
10.1002/macp.201100232
File:
PDF, 639 KB
english, 2011