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Open-air silicon etching by H2–He–CH4 flowing cold plasma
Khaliq Chaudhary, Kiyoto Inomata, Mamoru Yoshimoto, Hideomi KoinumaVolume:
57
Year:
2003
Language:
english
DOI:
10.1016/s0167-577x(03)00085-5
File:
PDF, 241 KB
english, 2003