High temperature phase and morphological changes of CVD-SiC films studied using in situ X-ray diffractometry
Toshiki Kingetsu, Kenjiro Ito, Masaharu TakeharaVolume:
36
Year:
1998
Language:
english
DOI:
10.1016/s0167-577x(98)00046-9
File:
PDF, 790 KB
english, 1998