Microstructural characterisation of TiAl thin films grown...

Materials Letters 2000 Vol. 43; Iss. 3

Microstructural characterisation of TiAl thin films grown by DC magnetron co-sputtering technique

C Padmaprabu, P Kuppusami, A.L.E Terrance, E Mohandas, V.S Raghunathan, Sangam Banerjee, Milan K Sanyal
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Volume:
43
Year:
2000
Language:
english
DOI:
10.1016/s0167-577x(99)00240-2
File:
PDF, 346 KB
english, 2000
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