Polyhedral Oligomeric Silsesquioxane Containing Copolymers...

Polyhedral Oligomeric Silsesquioxane Containing Copolymers for Negative-Type Photoresists

Ho-May Lin, Shi-Yin Wu, Pei-Yuan Huang, Chih-Feng Huang, Shiao-Wei Kuo, Feng-Chih Chang
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Volume:
27
Year:
2006
Language:
english
Pages:
6
DOI:
10.1002/marc.200600363
File:
PDF, 191 KB
english, 2006
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