Patterning of Tailored Polycarbonate Based Non-Chemically...

Macromolecular Rapid Communications 2010 Vol. 31; Iss. 16

Patterning of Tailored Polycarbonate Based Non-Chemically Amplified Resists Using Extreme Ultraviolet Lithography

Anguang Yu, Heping Liu, James P. Blinco, Kevin S. Jack, Michael Leeson, Todd R. Younkin, Andrew K. Whittaker, Idriss Blakey
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Volume:
31
Year:
2010
Language:
english
Pages:
7
DOI:
10.1002/marc.201000117
File:
PDF, 400 KB
english, 2010
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