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Thermodynamic calculations offer insight in the stability of materials: the annealing behavior of amorphous Ru-Si-O and Ir-Si-O thin films
Alexander Pisch, Claude BernardVolume:
25
Year:
2001
Language:
english
DOI:
10.1016/s0364-5916(02)00013-5
File:
PDF, 334 KB
english, 2001