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Atomic layer deposition of hafnium and zirconium silicate thin films
E. Vainonen-Ahlgren, E. Tois, T. Ahlgren, L. Khriachtchev, J. Marles, S. Haukka, M. TuominenVolume:
27
Year:
2003
Language:
english
DOI:
10.1016/s0927-0256(02)00426-3
File:
PDF, 142 KB
english, 2003