Theoretical Simulation of Surface Evolution Using the Random Deposition and Surface Relaxation for Metal Oxide Film in Atomic Layer Deposition
Ji-Hoon Ahn, Se-Hun Kwon, Jin-Hyock Kim, Ja-Yong Kim, Sang-Won KangVolume:
26
Year:
2010
Language:
english
DOI:
10.1016/s1005-0302(10)60061-8
File:
PDF, 587 KB
english, 2010