RE plasma deposition of amorphous silicon-germanium alloys: evidence for a chemisorption-based growth process
Bruno, G., Capezzuto, P., Cicala, G., Manodoro, P., Tassielli, V.Volume:
18
Year:
1990
Language:
english
DOI:
10.1109/27.61506
File:
PDF, 669 KB
english, 1990