Xenon Discharge-Produced Plasma Radiation Source for EUV...

IEEE Transactions on Industry Applications 2010 Vol. 46; Iss. 4

Xenon Discharge-Produced Plasma Radiation Source for EUV Lithography

Zhang, C.H., Lv, P., Zhao, Y.P., Wang, Q., Katsuki, S., Namihira, T., Horta, H., Imamura, H., Kondo, Y., Akiyama, H.
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Volume:
46
Year:
2010
Language:
english
DOI:
10.1109/tia.2010.2051059
File:
PDF, 773 KB
english, 2010
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