Diagnostics of Low-Pressure Oxygen RF Plasmas and the Mechanism for Polymer Etching: A Comparison of Reactive Sputter Etching and Magnetron Sputter Etching
Steinbruchel, Ch., Curtis, B. J., Lehmann, H. W., Widmer, R.Volume:
14
Year:
1986
Language:
english
DOI:
10.1109/tps.1986.4316516
File:
PDF, 1.74 MB
english, 1986