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Diagnostics of Low-Pressure Oxygen RF Plasmas and the...

Diagnostics of Low-Pressure Oxygen RF Plasmas and the Mechanism for Polymer Etching: A Comparison of Reactive Sputter Etching and Magnetron Sputter Etching

Steinbruchel, Ch., Curtis, B. J., Lehmann, H. W., Widmer, R.
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Volume:
14
Year:
1986
Language:
english
DOI:
10.1109/tps.1986.4316516
File:
PDF, 1.74 MB
english, 1986
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