A Kinetic Model for Plasma Etching Silicon in a SF6/O2 RF...

IEEE Transactions on Plasma Science 1986 Vol. 14; Iss. 2

A Kinetic Model for Plasma Etching Silicon in a SF6/O2 RF Discharge

Anderson, H. M., Merson, J. A., Light, R. W.
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Volume:
14
Year:
1986
Language:
english
DOI:
10.1109/tps.1986.4316518
File:
PDF, 2.05 MB
english, 1986
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