The effects of silicon nitride and silicon oxynitride...

The effects of silicon nitride and silicon oxynitride intermediate layers on the properties of tantalum pentoxide films on silicon: X-ray photoelectron spectroscopy, X-ray reflectivity and capacitance–voltage studies

M. Passacantando, F. Jolly, L. Lozzi, V. Salerni, P. Picozzi, S. Santucci, C. Corsi, D. Zintu
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
322
Year:
2003
Language:
english
DOI:
10.1016/s0022-3093(03)00206-0
File:
PDF, 272 KB
english, 2003
Conversion to is in progress
Conversion to is failed