Origin of Infrared Photoluminescence of Nanocrystalline Si...

Japanese Journal of Applied Physics 2000 / 6 Vol. 39; Iss. Part 1, No

Origin of Infrared Photoluminescence of Nanocrystalline Si in SiO 2 Films

Takahashi, Hiroshi, Nishimura, Toshio, Hashimoto, Yusuke, Takahashi, Shinichi, Kuwano, Hiroshi
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Volume:
39
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.39.3474
Date:
June, 2000
File:
PDF, 89 KB
english, 2000
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