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SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Emerging Lithographic Technologies VII - Software tool for advanced Monte Carlo simulation of electron scattering in EBL and SEM: CHARIOT
Babin, Sergey V., Borisov, S., Cheremukhin, E., Grachev, Eugene, Korol, V., Ocola, L. E., Engelstad, Roxann L.Volume:
5037
Year:
2003
Language:
english
DOI:
10.1117/12.504568
File:
PDF, 1.02 MB
english, 2003