Effects of Ar gas pressure on microstructure of DLC films deposited by high-power pulsed magnetron sputtering
Nakao, Setsuo, Yukimura, Ken, Ogiso, Hisato, Nakano, Shizuka, Sonoda, TsutomuVolume:
89
Language:
english
Journal:
Vacuum
DOI:
10.1016/j.vacuum.2012.07.004
Date:
March, 2013
File:
PDF, 516 KB
english, 2013