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Robust Block Copolymer Mask for Nanopatterning Polymer Films
Chao, Chia-Cheng, Wang, Tzu-Chung, Ho, Rong-Ming, Georgopanos, Prokopios, Avgeropoulos, Apostolos, Thomas, Edwin L.Volume:
4
Language:
english
Journal:
ACS Nano
DOI:
10.1021/nn901370g
Date:
April, 2010
File:
PDF, 422 KB
english, 2010