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[IEEE 2011 Semiconductor Conference Dresden (SCD) - Dresden, Germany (2011.09.27-2011.09.28)] 2011 Semiconductor Conference Dresden - In situ XPS investigation of the chemical surface composition during the ALD of ultra-thin aluminum oxide films
Geidel, Marion, Knaut, Martin, Albert, Matthias, Bartha, Johann W.Year:
2011
Language:
english
DOI:
10.1109/scd.2011.6068753
File:
PDF, 1.39 MB
english, 2011