SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, CA (Monday 14 September 2009)] Photomask Technology 2009 - Jet and flash imprint lithography for the fabrication of patterned media drives
Schmid, Gerard M., Brooks, Cynthia, Ye, Zhengmao, Johnson, Steve, LaBrake, Dwayne, Sreenivasan, S. V., Resnick, Douglas J., Zurbrick, Larry S., Montgomery, M. WarrenVolume:
7488
Year:
2009
Language:
english
DOI:
10.1117/12.833366
File:
PDF, 4.97 MB
english, 2009