[IEEE Digest of Technical Papers. 2005 Symposium on VLSI...

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[IEEE Digest of Technical Papers. 2005 Symposium on VLSI Technology, 2005. - Kyoto, Japan (June 14-16, 2005)] Digest of Technical Papers. 2005 Symposium on VLSI Technology, 2005. - Tall triple-gate devices with TiN/HfO/sub 2/ gate stack

Collaert, N., Demand, M., Ferain, I., Lisoni, J., Singanamalla, R., Zimmerman, P., Yim, Y.S., Schram, T., Mannaert, G., Goodwin, M., Hooker, J.C., Neuily, F., Kim, M.C., De Meyers, K., De Gendt, S., B
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Year:
2005
DOI:
10.1109/.2005.1469231
File:
PDF, 416 KB
2005
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