Surface organometallic chemistry in the chemical vapor deposition of aluminum films using triisobutylaluminum: .beta.-hydride and .beta.-alkyl elimination reactions of surface alkyl intermediates
Bent, Brian E., Nuzzo, Ralph G., Dubois, Lawrence H.Volume:
111
Language:
english
Journal:
Journal of the American Chemical Society
DOI:
10.1021/ja00187a016
Date:
March, 1989
File:
PDF, 1.99 MB
english, 1989