AIP Conference Proceedings [AIP ION IMPLANTATION TECHNOLOGY 2012: Proceedings of the 19th International Conference on Ion Implantation Technology - Valladolid, Spain (25–29 June 2012)] - TCAD simulation of the co-implantation species C, F, and N in MOS transistors
Bazizi, E. M., Mok, K. R. C., Benistant, F., Yeong, S. H., Teo, R. S., Zechner, C.Year:
2012
Language:
english
DOI:
10.1063/1.4766535
File:
PDF, 865 KB
english, 2012