Dry etching of GaN substrates for high-quality homoepitaxy
Schauler, M., Eberhard, F., Kirchner, C., Schwegler, V., Pelzmann, A., Kamp, M., Ebeling, K. J., Bertram, F., Riemann, T., Christen, J., Prystawko, P., Leszczynski, M., Grzegory, I., Porowski, S.Volume:
74
Year:
1999
Language:
english
DOI:
10.1063/1.123463
File:
PDF, 418 KB
english, 1999