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[IEEE 2012 IEEE Silicon Nanoelectronics Workshop (SNW) - Honolulu, HI, USA (2012.06.10-2012.06.11)] 2012 IEEE Silicon Nanoelectronics Workshop (SNW) - Simultaneous carrier transport enhancement and variability reduction in Si MOSFETs by insertion of partial monolayers of oxygen
Mears, R.J., Xu, N., Damrongplasit, N., Takeuchi, H., Stephenson, R.J., Cody, N.W., Yiptong, A., Huang, X., Hytha, M., King-Liu, T.-J.Year:
2012
Language:
english
DOI:
10.1109/snw.2012.6243326
File:
PDF, 389 KB
english, 2012