A New Perfluoropolyether-Based Hydrophobic and Chemically...

Langmuir 2013 / 01 Vol. 29; Iss. 1

A New Perfluoropolyether-Based Hydrophobic and Chemically Resistant Photoresist Structured by Two-Photon Polymerization

De Marco, Carmela, Gaidukeviciute, Arune, Kiyan, Roman, Eaton, Shane M., Levi, Marinella, Osellame, Roberto, Chichkov, Boris N., Turri, Stefano
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Volume:
29
Language:
english
Journal:
Langmuir
DOI:
10.1021/la303799u
Date:
January, 2013
File:
PDF, 3.56 MB
english, 2013
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