SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV - Direct inclusion of the proximity effect in the calculation of kinoforms
Bengtsson, Jorgen, Patterson, David O.Volume:
2194
Year:
1994
Language:
english
DOI:
10.1117/12.175819
File:
PDF, 411 KB
english, 1994