SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Design and Process Integration for Microelectronic Manufacturing IV - From poly line to transistor: building BSIM models for non-rectangular transistors
Poppe, Wojtek J., Capodieci, Luigi, Wu, Joanne, Neureuther, Andrew, Wong, Alfred K. K., Singh, Vivek K.Volume:
6156
Year:
2006
Language:
english
DOI:
10.1117/12.657051
File:
PDF, 296 KB
english, 2006