[IEEE 2012 IEEE Symposium on VLSI Technology - Honolulu, HI, USA (2012.06.12-2012.06.14)] 2012 Symposium on VLSI Technology (VLSIT) - Channel doping impact on FinFETs for 22nm and beyond
Lin, C.-H., Kambhampati, R., Miller, R. J., Hook, T. B., Bryant, A., Haensch, W., Oldiges, P., Lauer, I., Yamashita, T., Basker, V., Standaert, T., Rim, K., Leobandung, E., Bu, H., Khare, M.Year:
2012
Language:
english
DOI:
10.1109/vlsit.2012.6242438
File:
PDF, 221 KB
english, 2012