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[IEEE 2011 IEEE International Electron Devices Meeting (IEDM) - Washington, DC, USA (2011.12.5-2011.12.7)] 2011 International Electron Devices Meeting - Transistor matching and silicon thickness variation in ETSOI technology
Hook, Terence B., Vinet, Maud, Murphy, Richard, Ponoth, Shom, Grenouillet, LaurentYear:
2011
Language:
english
DOI:
10.1109/iedm.2011.6131497
File:
PDF, 452 KB
english, 2011