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[IEEE 2008 Symposium on VLSI Technology - Honolulu, HI, USA (2008.06.17-2008.06.19)] 2008 Symposium on VLSI Technology - Planar Bulk+ technology using TiN/Hf-based gate stack for low power applications
Bidal, G., Boeuf, F., Denorme, S., Loubet, N., Laviron, C., Leverd, F., Barnola, S., Salvetat, T., Cosnier, V., Martin, F., Grosjean, M., Perreau, P., Chanemougame, D., Haendler, S., Marin, M., Rafik,Year:
2008
Language:
english
DOI:
10.1109/vlsit.2008.4588596
File:
PDF, 1.15 MB
english, 2008