Benchmark test of Monte-Carlo simulation for high...

Microelectronic Engineering 2012 / 10 Vol. 98

Benchmark test of Monte-Carlo simulation for high resolution electron beam lithography

Rommel, Marcus, Hoffmann, Karl E., Reindl, Thomas, Weis, Jürgen, Unal, Nezih, Hofmann, Ulrich
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Volume:
98
Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2012.07.032
Date:
October, 2012
File:
PDF, 727 KB
english, 2012
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