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SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Emerging Lithographic Technologies IX - Full-chip lithography simulation and design analysis: how OPC is changing IC design
Spence, Chris, Mackay, R. ScottVolume:
5751
Year:
2005
Language:
english
DOI:
10.1117/12.608020
File:
PDF, 785 KB
english, 2005