SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Optical Microlithography XIX - High-index optical materials for 193nm immersion lithography
Burnett, John H., Kaplan, Simon G., Shirley, Eric L., Horowitz, Deane, Clauss, Wilfried, Grenville, Andrew, Van Peski, Chris, Flagello, Donis G.Volume:
6154
Year:
2006
Language:
english
DOI:
10.1117/12.656901
File:
PDF, 554 KB
english, 2006