Modeling the Conformality of Atomic Layer Deposition: The...

Journal of The Electrochemical Society 2009 Vol. 156; Iss. 4

Modeling the Conformality of Atomic Layer Deposition: The Effect of Sticking Probability

Dendooven, J., Deduytsche, D., Musschoot, J., Vanmeirhaeghe, R. L., Detavernier, C.
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Volume:
156
Year:
2009
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.3072694
File:
PDF, 216 KB
english, 2009
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