Total dose hardness of three commercial CMOS microelectronics foundries
Osborn, J.V., Lacoe, R.C., Mayer, D.C., Yabiku, G.Volume:
45
Language:
english
Journal:
IEEE Transactions on Nuclear Science
DOI:
10.1109/23.685223
Date:
June, 1998
File:
PDF, 618 KB
english, 1998