Simulation of the backscattered electron intensity of multi...

Ultramicroscopy 2013 / 1 Vol. 124

Simulation of the backscattered electron intensity of multi layer structure for the explanation of secondary electron contrast

Sulyok, A., Toth, A.L., Zommer, L., Menyhard, M., Jablonski, A.
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Volume:
124
Language:
english
Journal:
Ultramicroscopy
DOI:
10.1016/j.ultramic.2012.08.004
Date:
January, 2013
File:
PDF, 959 KB
english, 2013
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