Boron electrical activation in dual B++ N++ and B++ Ar+ion-implanted silicon
V. B. Odzhaev,V. N. Popok,V. S. Prosolovich,V. HnatowiczVolume:
62
Language:
english
DOI:
10.1007/bf01594233
Date:
April, 1996
File:
PDF, 352 KB
english, 1996