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Differences between the bonding of oxygen in glow discharge deposited a-Si:H and a-Ge:H
G. Lucovsky, S.S. Chao, J. Yang, J.E. Tyler, W. CzubatyjVolume:
66
Year:
1984
Language:
english
DOI:
10.1016/0022-3093(84)90305-3
File:
PDF, 333 KB
english, 1984