Comparison of strain in glow discharge a-Si:F and a-Si:H

Comparison of strain in glow discharge a-Si:F and a-Si:H

R. Weil, I. Abdulhalim, R. Beserman, M. Janai, B. Pratt
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Volume:
77-78
Year:
1985
Language:
english
DOI:
10.1016/0022-3093(85)90653-2
File:
PDF, 178 KB
english, 1985
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